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    公开号:NL2004281A
    申请号:NL2004281
    申请日:2010-02-22
    公开日:2010-09-20
    发明作者:Tjarko Empel；Martijn Houkes；Norbert Jansen
    申请人:Asml Netherlands Bv；
    IPC主号:
    专利说明:

    Lithographic Apparatus and Device Manufacturing Method
    FIELD
    [0001] The invention relates to a positioning apparatus provided with a first objectand a second object and to a lithographic apparatus including such a positioning apparatus.
    BACKGROUND
    [0002] Positioning apparatus, including a first object and a second object, are knownin lithographic apparatuses wherein the first object is part of a long stroke module and thesecond object is part of a short stroke module. The concept of the cooperation of thecombination of a long stroke and a short stroke concept is a well known machine layout for alithographic apparatus. Hereby, the long stroke module is responsible for a movement over along stroke with a limited accuracy and the short stroke module object is able to move over asmaller stroke with a higher position accuracy. The short stroke module is then connectedwith the long stroke module via a flexible transportation line for transportation of for exampleelectricity, fluids, vacuum applications, et cetera. A specific example is that the short stroke isprovided with water via the flexible transportation line.
    [0003] In the known positioning apparatus, the stiffness, damping and mass propertiesof the flexible transportation line act as a static and dynamic disturbance force between thefirst object and the second object. If the mass of the flexible transportation line is connectedwith a too low stiffness, a low natural frequency of the flexible transportation line may causeundcsircd disturbance forces due to the free moving mass of the flexible transportation line.Increasing the natural frequency of the flexible transportation line by increasing the stiffnessof the flexible transportation line raises the direct coupling between the objects. The dynamicdisturbance effects may result in position errors of the first object and the second object.Accordingly and as a consequence, these position errors may result in undesired imagingproblems and/or overlay errors of the lithographic apparatus.
    SUMMARY
    [0004] An aspect of the invention is to reduce the dynamic disturbances of theflexible transportation line. Accordingly, one embodiment of the invention is based on theinsight that it is desirable to obtain a sophisticated balance between, on the one hand, aflexible transportation line with a relatively low mutual stiffness and, on the other hand, ahigh internal stiffness of the flexible transportation line to prevent relatively low frequent dynamic behavior of the flexible transportation line. Accordingly, in one embodiment of theinvention, a flexible transportation line is provided with a stiffness as function of the positionat the flexible transportation line achieving a dynamic transfer function of the flexibletransportation line which is adapted to a closed-loop transfer function of the positioningsystem.
    [0005] The effect of adapting the flexible transportation line according to anembodiment of the invention is that a balance can be obtained between mutual stiffnessrequirements, on the one hand, and the dynamic behavior of the flexible transportation line,on the other hand, based on knowledge of a close-loop transfer function of the positioning system.
    [0006] In a preferred embodiment, the flexible transportation line is provided with astiffness as function of the position at the flexible transportation line such that the flexibletransportation line (FTL) has a first hinge (HNG1). Such an embodiment has the beneficialeffect that a relatively low mutual stiffness is created between the first and the second object.
    [0007] In a further embodiment, the flexible transportation line may further include asubstantially straight and dimensionally stable first part and a substantially straight anddimensionally stable second part wherein the first part and the second part are connected viathe first hinge such that the parts can pivot with respect to each other around the hinge. Suchan embodiment has the beneficial effect that the high internal stiffness of the flexibletransportation line prevents relatively low frequent dynamic behavior of the flexibletransportation line.
    BRIEF DESCRIPTION OF THE DRAWINGS
    [0008] Embodiments of the invention will now be described, by way of example only,with reference to the accompanying schematic drawings in which corresponding referencesymbols indicate corresponding parts, and in which:
    [0009] Figure 1 schematically depicts a lithographic apparatus according to oneembodiment of the invention;
    [0010] Figure 2 shows a top view of a positioning apparatus provided with a firstobject and a second object which is further provided with a flexible transportation line;
    [0011] Figure 3 schematically shows a position apparatus including a long strokemodule and a short stroke module in accordance with one embodiment of the invention;
    [0012] Figure 4 shows a standard control diagram in which a controller set-point isinjected into a combined feed-forward and feedback control system;
    [0013] Figure 5 shows an example of process sensitivity transfer function from a freemoving mass controlled by a PID-controllcr and a specified controller bandwidth;
    [0014] Figure 6 schematically shows a zoomed schematic representation of theembodiment as shown in Figure 3;
    [0015] Figure 7 shows a further schematic representation of Figure 6;
    [0016] Figure 8 shows an example of a flexible transportation line according to anembodiment of the invention;
    [0017] Figure 9 schematically shows a flexible transportation line coupled to twoobjects in accordance with one embodiment of the current invention;
    [0018] Figure 10 schematically shows a flexible transportation line coupled to twoobjects in accordance with another embodiment of the current invention;
    [0019] Figure 11 schematically shows a flexible transportation line coupled to twoobjects in accordance with another embodiment of the current invention;
    [0020] Figure 12 schematically shows a flexible transportation line coupled to twoobjects wherein the first hinge has a neutral position whereby the pivot angle equalssubstantially 90 degrees in accordance with one embodiment of the invention;
    [0021] Figure 13 schematically shows a flexible transportation line coupled to twoobjects in accordance with another embodiment of the invention; and
    [0022] Figure 14 schematically shows a flexible transportation line coupled to twoobjects in accordance with one embodiment of the invention.
    DETAILED DESCRIPTION
    [0023] Figure 1 schematically depicts a lithographic apparatus according to oneembodiment of the invention. The apparatus includes an illumination system (illuminator) ILconfigured to condition a radiation beam B (e.g. UV radiation or EUV radiation); a patterningdevice support or support structure (e.g. a mask table) MT constructed to support a patterningdevice (e.g. a mask) MA and connected to a first positioner PM configured to accuratelyposition the patterning device in accordance with certain parameters; a substrate table (e.g. awafer table) WT constructed to hold a substrate (e.g. a resist coated wafer) W and connectedto a second positioner PW configured to accurately position the substrate in accordance withcertain parameters; and a projection system (e.g. a refractive projection lens system) PSconfigured to project a pattern imparted to the radiation beam B by patterning device MAonto a target portion C (e.g. including one or more dies) of the substrate W.
    [0024] The illumination system may include various types of optical components,such as refractive, reflective, magnetic, electromagnetic, electrostatic or other types of opticalcomponents, or any combination thereof, to direct, shape, or control radiation.
    [0025] The patterning device support holds the patterning device in a manner thatdepends on the orientation of the patterning device, the design of the lithographic apparatus,and other conditions, such as for example whether or not the patterning device is held in avacuum environment. The patterning device support can use mechanical, vacuum,electrostatic or other clamping techniques to hold the patterning device. The patterningdevice support may be a frame or a table, for example, which may be fixed or movable asrequired. The patterning device support may ensure that the patterning device is at a desiredposition, for example with respect to the projection system. Any use of the terms “reticle” or“mask” herein may be considered synonymous with the more general term “patterningdevice.”
    [0026] The term “patterning device” used herein should be broadly interpreted asreferring to any device that can be used to impart a radiation beam with a pattern in its cross-section such as to create a pattern in a target portion of the substrate. It should be noted thatthe pattern imparted to the radiation beam may not exactly correspond to the desired patternin the target portion of the substrate, for example if the pattern includes phase-shiftingfeatures or so called assist features. Generally, the pattern imparted to the radiation beam willcorrespond to a particular functional layer in a device being created in the target portion, suchas an integrated circuit.
    [0027] The patterning device may be transmissive or reflective. Examples ofpatterning devices include masks, programmable mirror arrays, and programmable LCDpanels. Masks are well known in lithography, and include mask types such as binary,alternating phase-shift, and attenuated phase-shift, as well as various hybrid mask types. Anexample of a programmable mirror array employs a matrix arrangement of small mirrors,each of which can be individually tilted so as to reflect an incoming radiation beam indifferent directions. The tilted mirrors impart a pattern in a radiation beam which is reflectedby the mirror matrix.
    [0028] The term “projection system” used herein should be broadly interpreted asencompassing any type of projection system, including refractive, reflective, catadioptric,magnetic, electromagnetic and electrostatic optical systems, or any combination thereof, asappropriate for the exposure radiation being used, or for other factors such as the use of an immersion liquid or the use of a vacuum. Any use of the term “projection lens” herein may beconsidered as synonymous with the more general term “projection system”.
    [0029] As here depicted, the apparatus is of a transmissive type (e.g. employing atransmissive mask). Alternatively, the apparatus may be of a reflective type (e.g. employing aprogrammable mirror array of a type as referred to above, or employing a reflective mask).
    [0030] The lithographic apparatus may be of a type having two (dual stage) or moresubstrate tables (and/or two or more mask tables). In such “multiple stage” machines theadditional tables may be used in parallel, or preparatory steps may be carried out on one ormore tables while one or more other tables are being used for exposure.
    [0031] The lithographic apparatus may also be of a type wherein at least a portion ofthe substrate may be covered by a liquid having a relatively high refractive index, e.g. water,so as to fill a space between the projection system and the substrate. An immersion liquidmay also be applied to other spaces in the lithographic apparatus, for example, between themask and the projection system. Immersion techniques are well known in the art forincreasing the numerical aperture of projection systems. The term “immersion” as usedherein does not mean that a structure, such as a substrate, must be submerged in liquid, butrather only means that liquid is located between the projection system and the substrateduring exposure.
    [0032] Referring to Figure 1, the illuminator IL receives a radiation beam from aradiation source SO. The source and the lithographic apparatus may be separate entities, forexample when the source is an excimer laser. In such cases, the source is not considered toform part of the lithographic apparatus and the radiation beam is passed from the source SOto the illuminator IL with the aid of a beam delivery system BD including, for example,suitable directing mirrors and/or a beam expander. In other cases the source may be anintegral part of the lithographic apparatus, for example when the source is a mercury lamp.The source SO and the illuminator IL, together with the beam delivery system BD if required,may be referred to as a radiation system.
    [0033] The illuminator IL may include an adjuster AD for adjusting the angularintensity distribution of the radiation beam. Generally, at least the outer and/or inner radialextent (commonly referred to as σ-outer and σ-inner, respectively) of the intensitydistribution in a pupil plane of the illuminator can be adjusted. In addition, the illuminator ILmay include various other components, such as an integrator IN and a condenser CO. Theilluminator may be used to condition the radiation beam, to have a desired uniformity andintensity distribution in its cross section.
    [0034] The radiation beam B is incident on the patterning device (e.g., mask) MA,which is held on the patterning device support (c.g., mask tabic) MT, and is patterned by thepatterning device. Having traversed the patterning device (e.g. mask) MA, the radiation beamB passes through the projection system PS, which focuses the beam onto a target portion C ofthe substrate W. With the aid of the second positioner PW and position sensor IF (e.g. aninterferometric device, linear encoder or capacitive sensor), the substrate table WT can bemoved accurately, e.g. so as to position different target portions C in the path of the radiationbeam B. Similarly, the first positioner PM and another position sensor (which is not explicitlydepicted in Figure 1) can be used to accurately position the patterning device (e.g. mask) MAwith respect to the path of the radiation beam B, e.g. after mechanical retrieval from a masklibrary, or during a scan. In general, movement of the patterning device support (e.g. masktable) MT may be realized with the aid of a long-stroke module (coarse positioning) and ashort-stroke module (fine positioning), which form part of the first positioner PM. Similarly,movement of the substrate table WT may be realized using a long-stroke module and a short-stroke module, which form part of the second positioner PW. In the case of a stepper (asopposed to a scanner) the patterning device support (e.g. mask table) MT may be connectedto a short-stroke actuator only, or may be fixed. Patterning device (e.g. mask) MA andsubstrate W may be aligned using patterning device alignment marks Ml, M2 and substratealignment marks PI, P2. Although the substrate alignment marks as illustrated occupydedicated target portions, they may be located in spaces between target portions (these areknown as scribe-lane alignment marks). Similarly, in situations in which more than one die isprovided on the patterning device (c.g. mask) MA, the patterning device alignment marksmay be located between the dies.
    [0035] The depicted apparatus could be used in at least one of the following modes:
    [0036] 1. In step mode, the patterning device support (e.g. mask table) MT andthe substrate table WT are kept essentially stationary, while an entire pattern imparted to theradiation beam is projected onto a target portion C at one time (i.e. a single static exposure).The substrate table WT is then shifted in the X and/or Y direction so that a different targetportion C can be exposed. In step mode, the maximum size of the exposure field limits thesize of the target portion C imaged in a single static exposure.
    [0037] 2. In scan mode, the patterning device support (e.g. mask table) MT andthe substrate table WT are scanned synchronously while a pattern imparted to the radiationbeam is projected onto a target portion C (i.e. a single dynamic exposure). The velocity anddirection of the substrate table WT relative to the patterning device support (e.g. mask table) MT may be determined by the (de-)magnification and image reversal characteristics of theprojection system PS. In scan mode, the maximum size of the exposure field limits the width(in the non-scanning direction) of the target portion in a single dynamic exposure, whereasthe length of the scanning motion determines the height (in the scanning direction) of thetarget portion.
    [0038] 3. In another mode, the patterning device support (e.g. mask table) MT iskept essentially stationary holding a programmable patterning device, and the substrate tableWT is moved or scanned while a pattern imparted to the radiation beam is projected onto atarget portion C. In this mode, generally a pulsed radiation source is employed and theprogrammable patterning device is updated as required after each movement of the substratetable WT or in between successive radiation pulses during a scan. This mode of operation canbe readily applied to maskless lithography that utilizes programmable patterning device, suchas a programmable mirror array of a type as referred to above.
    [0039] Combinations and/or variations on the above described modes of use orentirely different modes of use may also be employed.
    [0040] Figure 2 shows a top view of the positioning apparatus (APP) provided with afirst object (OBJ1) and a second object (OBJ2). The positioning apparatus (APP) can be usedto position objects in the lithographic apparatus. The positioning apparatus (APP) is providedwith a positioning system (POS) configured to position the second object (OBJ2) with respectto the first object (OBJ1) and is further provided with a flexible transportation line (FTL)which connects the objects. The flexible transportation line (FTL) is, for example,constructed and arranged to transport a medium or the flexible transportation line (FTL) is,for example, a wire provided to transport electricity between the first object (OBJ1) and thesecond object (OBJ2) but there may also be a flexible transportation line (FTL) to transport amedium and/or a flexible transportation line (FTL) to transport electricity. In an embodimentof the invention, the positioning apparatus consists of a two stage concept wherein the firstobject (OBJ1) corresponds to a long stroke module that is responsible for a movement over along stroke with a limited accuracy and the second object (OBJ2) corresponds to a shortstroke module object that is able to move over a smaller stroke with a higher positionaccuracy.
    [0041] Figure 3 shows a schematic representation of such an embodiment of theinvention wherein the position apparatus (APP) consists of a long stroke module (LS) and ashort stroke module (SS). Each module can be divided into a stationary and a moveable part,wherein each module includes a motor (not shown) to move the moveable part of the module relative to the stationary part. The moveable part of the long stroke module (LSM) ismoveable relative to the stationary part of the long stroke module (LSS) in at least onedirection. The moveable part of the short stroke module (SSM) is moveable relative to thestationary part of the short stroke module (SSS) in at least one direction. The stationary partof the short stroke module (SSS) is attached to the movable part of the long stroke module(LSM). In this embodiment of the invention, the first object (OBJ1) consists out of themovable part of the long stroke module (LSM) including the stationary part of the shortstroke module (SSS) (indicated as the hatched part in Figure 3) and the second object (OBJ2)corresponds to the movable part of the short stroke module (SSM).
    [0042] Figure 4 depicts a standard control diagram in which a controller set-point(SETP) is injected into a combined feedforward (FF) and feedback (FB) control system. Afeedback control loop is formed by the controller (FB) and the physical plant (PLT). Thephysical plant (PLT) represents a transfer function from an actuator drive signal (ADS) of thestage to a position measurement signal (PMS) as provided by any suitable measurementsystem, Besides actuator forces acting on the physical plant (PLT) due to the controller set-point (SETP), the actual position of the physical plant (PLT) may also be influenced by anexternal disturbance source (DIST) causing an external disturbance force (FDIST) whicheffect are corrected by the feedback control loop. Because there is no a-priori knowledge ofthe disturbance force (FDIST) some delay might be caused by the feedback loop. As aconsequence such kind of disturbance inherently affects the position accuracy of the physicalplant (PLT). The sensitivity of the position measurement signal (PMS) due to such externaldisturbance force (FDIST) can be expressed in a transfer function which is known in the artas the process sensitivity transfer function (HPS). This frequency dependent transfer functioncan be expressed as indicated in Equation (1).
    (1)
    [0043] Figure 5 shows an example of a bode diagram of a typical process sensitivitytransfer function (HPS) from a free moving mass of 20 [kg] controlled by a PID-controllerwith a selected bandwidth (BW) of approximately 300 [Hz], The upper part of the diagramshows the magnitude (MAG) of the transfer function in decibel (dB) of the process sensitivityas function of the frequency (FRQ) in Hertz (Hz) and the lower part of the diagram shows thephase (PHA) of the transfer function in degrees (Deg) of the process sensitivity as function of the frequency (FRQ). Below the bandwidth (BW) the feedback controller (FB) is able tosuppress the effects of the disturbance force (DIST) to a certain extent especially because, inthis example, an integral action is included in the feedback-controller. If no integral actionwas included in the feedback controller (FB) the process sensitivity would substantially beinversely proportional to the proportional gain of the feedback controller (FB) up to thebandwidth of the feedback controller (FB). Above the bandwidth the feedback controller(FB) is no longer able to influence the transfer junction of the process sensitivity (HPS) andthe well known -2 slope of a free moving mass becomes visible above the bandwidth (BW) asindicated in figure 5. From this transfer function it may be concluded that the positionmeasurement signal (POS) is less sensitive for a high frequent disturbance force (DIST)compared with a low frequent disturbance force. Stated more generally, the effect of anexternal disturbance force (FDIST) on the position measurement signal (PMS) depends onthe frequency and the amplitude of the external disturbance force (FDIST). Some examples,of such disturbance forces and the accompanying requirements for the flexible transportationline (FTL) may be described as: - The pressure drop of a medium transported between the objects (OBJ1) and (OBJ2)should be low for example to allow sufficient transport and to minimize flow noise.Therefore, it is preferable to use a flexible transportation line (FTL) with a large diameter.Increasing the diameter while using the same wall thickness results however in anincreased mass of the flexible transportation line (FTL).
    - The free vibrating mass attached to the objects (OBJ1) and (OBJ2) should preferably besmall and high frequent regarding servo errors. Therefore, it is desirable to use a flexibletransportation line (FTL) with a low mass and a high stiffness.
    - The stiffness between the objects (OBJi) and (OBJ2) should be low for example todecrease distortions of the objects. Therefore, it is desirable to use a flexibletransportation line (FTL) with a low stiffness.
    - For specific applications (for example high-vacuum) the material of the flexibletransportation line (FTL) should preferably be high purity, non-outgassing, low diffusion.Therefore, it is desirable to use a flexible transportation line (FTL) from an inherent stiffmaterial.
    [0044] In an embodiment according to the invention, wherein the positioningapparatus consists of a two stage concept and the first object (OBJI) corresponds with a longstroke module (LS) that is responsible for a movement over a long stroke with a limited accuracy and the second object (OBJ2) corresponds with a short stroke module (SS) that isable to move over a smaller stroke with a higher position accuracy, the flexible transportationline forms a direct connection between the modules. Due to the stiffness of the flexibletransportation line (FTL), relative movement between the long stroke module (LS) and theshort stroke module (SS) results in a certain deformation of the flexible transportation (FTL)causing a disturbance force on the modules. For low frequent disturbance forces, the forcesubstantially corresponds with the static stiffness of the flexible transportation line (FTL)multiplied with the mutual displacement between the modules.
    10045] Figure 6 shows a zoomed schematic representation of an embodimentaccording to the invention, wherein the flexible transportation line (FTL) is connectedbetween the first object (OBJ1) that is shown as the hatched part and which is formed by themovable part of the long stroke (LSM) including the stationary part of the short stroke (SSS)and the second object (OBJ2) corresponding to the movable part of the short stroke (SSM). InFigure 6, the flexible transportation line (FTL) is virtually divided in a first part of theflexible transportation line (FTL’) and a second part of the flexible transportation line(FTL’ ’) by the cross-cut (CC). The physical behavior of the first object (OBJ1) and thesecond object (OBJ2) are influenced by the dynamic behavior of respective the first part(FTL’) and the second part (FTL”) of the flexible transportation line (FTL) respectively.
    [0046] Figure 7 shows a schematic representation of the first object (OBJ1) and thesecond object (OBJ2) including the first part of the flexible transportation line (FTL’) and thesecond part of the flexible transportation line (FTL”) separated by the cross-cut (CC). Theparts obtain specific dynamic properties like mass, stiffness and damping as indicated by (m),(k) and (d) respectively. There is no active control mechanism or controller configured tocontrol the position of the flexible transportation line (FTL) in such an embodiment. Afterfinishing, for example, an acceleration or deceleration set-point, the parasitic dynamic systemcorresponding to the flexible transportation line (FTL) performs a damped vibration until allenergy is dissipated. Such damped vibration causes an external disturbance force (FDIST) onboth the first object (OBJ1) and the second object (OBJ2) and accordingly influences thedynamic performance of the objects as earlier described in Figure 4.
    [0047] As an example, for a substantially static disturbance force on the second object(OBJ2) due to the parasitic dynamics of the second part of the flexible transportation line(FTL”) with a stiffness constant (k), such disturbance force can be determined according toEquation (2) wherein the mutual displacement between the second part of the flexibletransportation line (FTL”) and the second object (OBJ2) is referred to as ε.
    (2)
    [0048] As an example, in case of a substantially dynamic disturbance force on thesecond object (OBJ2), the relationship between the mutual displacement between the secondpart of the flexible transportation line (FTL”) and the second object (OBJ2) and theacceleration of the second object (OBJ2) can be calculated according to Equation (3)
    (3)
    [0049] Wherein coo refers to the natural frequency of the second part of the flexibletransportation line (FTL”), ‘a’ refers to the acceleration of the second object (OBJ2) and ξrefers to the percentage critical damping of the damper (d). Substitution of Equation (3) intoEquation (2) results in an expression for the amplitude and the frequency of the externaldisturbance force (FDIST) acting on the second object (OBJ2), for example due to anacceleration or deceleration of the second object (OBJ2).
    (4)
    [0050] As shown in Figure 4, a feed-forward control signal (FF) may also be appliedto the physical system (PLT) for control purposes. As known from the art, a certain mismatchbetween the required and the actual feed-forward signal (FF) is hardly inevitable and may becaused, for example, by inaccuracies of tuned parameters, non-linearity’s of the physicalproperties and variations in the physical system (PLT). This may result worst-case in a step-response of the physical system (PLT), causing an excitation of the flexible transportationline (FTL) dynamics represented as a mass-spring-damper system according to Figure 7. Theexternal disturbance force (FDIST) caused by such a mass-spring-damper system is shown inEquation 4.
    [0051] Applying an arbitrary force on a substantially free moving mass such as thesecond object (OBJ2) according to the described embodiment, the dynamic transfer function between the displacement of the free moving mass ‘m’ and the force applied on the freemoving mass may be represented according to Equation (5)
    (5)
    [0052] After rearrangement of Equation 5 wherein the frequency of the disturbanceforce (FDIST) where the disturbance force exists is substituted as coe, the frequencydependent displacement ‘x’ of such a free moving mass may be expressed according toEquation 6.
    (6)
    [0053] Further substitution of Equation 4 into Equation 6 results in Equation 7representing the displacement V due to a certain acceleration ‘a’ applied to a free movingmass such as the second object (OBJ2) according to an embodiment of the invention.
    (7)
    [0054] From Equation (7) it may be concluded that regarding the cause of thedescribed disturbance forces (FDIST), a small displacement of the second object (OBJ2)preferably requires a combination of a low mutual stiffness, low acceleration and/ordeceleration levels, a high mass of the second object (OBJ2) and a high natural frequency ofthe dynamic system such as a flexible transportation line (FTL). Although Equation (7) isderived for a case wherein the acceleration profile is applied as a step response, which isknown in the art as a 2nd order set-point profile, even more advanced acceleration set-pointprofiles like 3th or 4th order profiles can not solve the contradictive requirements as shown inEquation 7. Current developments tend to lighter stages, increased acceleration anddeceleration levels and higher required accuracies causing that the displacement of the secondobject (OBJ2) increases instead of decreases which is undesirable. With the describedanalysis, it can be concluded that it is desirable to obtain a sophisticated balance between, on the one hand, a flexible transportation line (FTL) with a relatively low mutual stiffness and,on the other hand, a high internal stiffness of the flexible transportation line to preventrelatively low frequent dynamic behavior of the flexible transportation line (FTL). Theflexible transportation line (FTL) is therefore provided with a stiffness as function of theposition at the flexible transportation line (FTL) achieving a dynamic transfer function (DTF)of the flexible transportation line (FTL), which is adapted to the closed-loop transfer functionof the positioning system (POS). Until now the flexible transportation line (FTL) wasrepresented as a lumped mass single degree of freedom (DOF) dynamic system, but in realitythe flexible transportation line (FTL) is a flexible part containing frequency dependentcomplex mode shapes which may act as parasitic dynamic forces on the objects in each ofsuch DOF’s.
    [0055] Figure 8A shows a side-view of a flexible transportation line (FTL) accordingto an embodiment of the invention and indicates that the flexible transportation line (FTL)may have a substantially irregular outer diameter. Figure 8B shows a cross-section of theflexible transportation line (FTL) according to the line A-A as shown in Figure 8A. Thecross-section indicates that the flexible transportation line (FTL) may be constructed andarranged with a first material (ΜΑΤΙ) over the complete length of the flexible transportationline (FTL) in the range between [1=0; 1=L] and further may be provided with a secondmaterial (MAT2) with a certain thickness on top of the base material in the range between[l=lo; l=li ]. As an example the flexible transportation line (FTL) may even be provided with athird material (MAT3) with a certain thickness on top of the base material in the rangebetween [1=12; 1=L]. Figure 8C shows an example of the stiffness as function of the position atthe flexible transportation line (FTL) wherein the stiffness of the flexible transportation line(FTL) equals Ci in the ranges between [1=0; 1=L], [l=li; 1=L and [l=l3;l=L] using a firstmaterial (ΜΑΤΙ) and wherein the stiffness of the flexible transportation line (FTL) equals C2and C3 respective in the range between [l=lo; l=li] and [1=12; 1=13] using a second material(MAT2) and third material (MAT3) respectively. A person skilled in the art will appreciatethat a certain stiffness may also be provided by combining more layers of the same ordifferent materials, but will also appreciate that the first (MAT 1), second (MAT2) and thirdmaterial (MAT3) may also be the same material and that different stiffness can be arrangedby varying the material thickness.
    [0056] Figure 9 shows a flexible transportation line according to an embodiment ofthe invention. In Figure 9, the stiffness as function of the position at the flexibletransportation line is such that the flexible transportation line (FTL) has a first hinge (HNG1).
    In this embodiment, the mutual stiffness between the first object (OBJ1) and the secondobject (OBJ2) decreases while the dynamic behavior of the flexible transportation line ishardly influenced.
    [0057] Figure 10 shows a flexible transportation line according to an embodiment ofthe invention. In Figure 10, the stiffness as function of the position at the flexibletransportation line (FTL) is such that the flexible transportation line (FTL) includes asubstantially straight and dimensionally stable first part (FTL1) and a second substantiallystraight and dimensionally stable part (FTL2) which are connected with the first hinge(HNG1) such that the parts can pivot with respect to each other around the hinge (HNG1).The hinge is preferably free from play and substantially stiff in all directions except aroundthe pivot angle. In such an embodiment the first object (OBJ1) and the second object (OBJ2)are coupled with a low mutual stiffness while the internal stiffness of the first part of theflexible transportation line (FTL1) and the second part of the flexible transportation line(FTL2) are increased. Due to the increased internal stiffness of the first part of the flexibletransportation line (FTL1) and the second part of the flexible transportation line (FTL2) thenatural frequency of the parts increases, which may result in a better dynamic performance ofat least the second object (OBJ2) improving the imaging and the overlay performance.
    [0058] Figure 11 shows yet another embodiment of the invention wherein the firsthinge (HNG1) has a pivot angle between the parts, wherein the pivot angle (a) has a rangebetween 0 and 360 degrees. In such an embodiment the first hinge (HNG1) allows the secondobject (OBJ2) to move with respect to the first object (OBJ1) around the pivot angle (a) witha range as indicated although the first part of flexible transportation line (FTL1) and thesecond part of flexible transportation line (FTL2) are substantially straight and dimensionallystable.
    [0059] Figure 12 shows an embodiment of the invention wherein the first hinge(HNG1) has a neutral position whereby the pivot angle equals substantially 90 degrees andwherein the flexible transportation line (FTL) is substantially free from internal stress. Such aneutral position may be realized by using a preformed flexible transportation line. As anexample, the largest range of motion of the first object (OBJ1) and the second object (OBJ2)may be in the horizontal xy-plane. The embodiment has the benefit that horizontal movementof the first object (OBJ1) causes less disturbance forces (FDIST) through the flexibletransportation line (FTL) onto the second object (OBJ2) due to the relatively low mutualstiffness between the objects and on the other hand a high internal stiffness of the flexible transportation line (FTL) preventing relatively low frequent dynamic behavior of the flexibletransportation line (FTL).
    [0060] Figure 13 shows a further embodiment of the invention wherein the stiffnessas function of the position at the flexible transportation line is such that the flexibletransportation line (FTL) has respectively a second hinge (HNG2) and a third hinge (HNG3)located nearby respectively the first object (OBJ1) and the second object (OBJ2). A benefit ofsuch an embodiment results in an even further decreased mutual stiffness between the objectswhereas the internal stiffness of the of the first part of the flexible transportation line (FTL1)and the second part of the flexible transportation line (FTL2) are kept at substantially thesame level. A further embodiment of the flexible transportation line (FTL) may includesubstantially straight and dimensionally stable parts with a reduced torsion stiffness in thetransportation direction. Such a reduced torsion stiffness may be constructed and arranged bycutting notches in the outer diameter of the first part (FTL1) and/or second part (FTL2) of theflexible transportation line (FTL). In such an embodiment even a better balance can berealized between the mutual stiffness and on the other hand a high internal stiffness toprevent relatively low frequent dynamic behavior of the flexible transportation line (FTL).
    [0061] Figure 14 shows an embodiment of the invention wherein the first part of theflexible transportation line (FTL1) attached to the first object (OBJ1) is provided with asubstantially curved and dimensionally stable part (FTL1) nearby the first hinge (HNG1).
    This embodiment has a further benefit because more mass of the flexible transportation line(FTL) is attached to the first object (OBJ1) which object has reduced dynamic performancerequirements compared with the second object (OBJ2). A further benefit of the substantiallycurved and dimensionally stable part (FTL1) from this embodiment is a reduced staticdisturbance force caused by impulse variations when, for example, the transport direction of acooling medium changes from, for example, a horizontal direction (e.g. y-direction) into, forexample, a vertical direction (e.g. z-direction) as the medium flows for example from the firstobject (OBJ1) to the second object (OBJ2). A disturbance force (FDIST) that needs to becompensated by the physical plant (PLT) results in heat generation in the actuator system,and consequently requires a certain amount of cooling medium to keep the actuator system ata predefined level. Reduced force levels result consequently in less heat generation andaccordingly require less cooling medium.
    [0062] Although specific reference may be made in this text to the use of lithographicapparatus in the manufacture of ICs, it should be understood that the lithographic apparatusdescribed herein may have other applications, such as the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat-panel displays,liquid-crystal displays (LCDs), thin-film magnetic heads, etc. The skilled artisan willappreciate that, in the context of such alternative applications, any use of the terms “wafer” or“die” herein may be considered as synonymous with the more general terms “substrate” or“target portion”, respectively. The substrate referred to herein may be processed, before orafter exposure, in for example a track (a tool that typically applies a layer of resist to asubstrate and develops the exposed resist), a metrology tool and/or an inspection tool. Whereapplicable, the disclosure herein may be applied to such and other substrate processing tools.Further, the substrate may be processed more than once, for example in order to create amulti-layer IC, so that the term substrate used herein may also refer to a substrate that alreadycontains multiple processed layers.
    [0063] Although specific reference may have been made above to the use ofembodiments of the invention in the context of optical lithography, it will be appreciated thatthe invention may be used in other applications, for example imprint lithography, and wherethe context allows, is not limited to optical lithography. In imprint lithography a topographyin a patterning device defines the pattern created on a substrate. The topography of thepatterning device may be pressed into a layer of resist supplied to the substrate whereuponthe resist is cured by applying electromagnetic radiation, heat, pressure or a combinationthereof. The patterning device is moved out of the resist leaving a pattern in it after the resistis cured.
    [0064] The terms “radiation” and “beam” used herein encompass all types ofelectromagnetic radiation, including ultraviolet (UV) radiation (c.g. having a wavelength ofor about 365, 355, 248, 193, 157 or 126 nm) and extreme ultra-violet (EUV) radiation (e.g.having a wavelength in the range of 5-20 nm), as well as particle beams, such as ion beams orelectron beams.
    [0065] The term “lens”, where the context allows, may refer to any one orcombination of various types of optical components, including refractive, reflective,magnetic, electromagnetic and electrostatic optical components.
    [0066] While specific embodiments of the invention have been described above, itwill be appreciated that the invention may be practiced otherwise than as described. Forexample, the invention may take the form of a computer program containing one or moresequences of machine-readable instructions describing a method as disclosed above, or a datastorage medium (e.g. semiconductor memory, magnetic or optical disk) having such acomputer program stored therein.
    [0067] The descriptions above are intended to be illustrative, not limiting. Thus, itwill be apparent to one skilled in the art that modifications may be made to the invention asdescribed without departing from the scope of the clauses set out below. Other aspects of theinvention are set out as in the following numbered clauses: 1. A positioning apparatus comprising:a first object and a second object; a positioning system configured to position the first and the second objects withrespect to each other; and a flexible transportation line that is connected to the first and the second objects, theflexible transportation line having a stiffness that varies along the flexible transportation linesuch that said flexible transportation line can be represented by a dynamic transfer function,said dynamic transfer function being adapted to a closed-loop transfer function of thepositioning system.
    2 The apparatus of clause 1, wherein the flexible transportation line has a first hinge.
    3 The apparatus of clause 2, wherein the flexible transportation line comprises asubstantially straight and dimensionally stable first part and a substantially straight anddimensionally stable second part wherein the first part and the second part are connected viathe first hinge such that the first and second parts can pivot with respect to each other aroundthe hinge.
    4. The apparatus of clause 3, wherein the first hinge has a pivot angle between the firstand second parts, wherein the pivot angle has a range between 0 and 360 degrees.
    5. The apparatus of clause 4, wherein the first hinge has a neutral position and the pivotangle equals substantially 90 degrees.
    6. The apparatus of clause 3, wherein the flexible transportation line has a second hingeand a third hinge located nearby respectively the first object and the second object.
    7. The apparatus of clause 2, wherein the first part of the flexible transportation lineattached to the first object is provided with a substantially curved and dimensionally stablepart nearby the first hinge.
    8. The apparatus of clause 1, wherein the flexible transportation line is a hoseconstructed and arranged to transport a medium and/or a wire configured to transportelectricity or optical information between the first object and the second object of thepositioning apparatus.
    9. A lithographic apparatus comprising: a patterning device support constructed to support a patterning device, the patterningdevice being capable of imparting a radiation beam with a pattern in a cross-section to form apatterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a targetportion of the substrate; and a positioning apparatus including a first object and a second object; a positioning system configured to position the first and the second objectswith respect to each other; and a flexible transportation line that is connected to the first and the secondobjects, the flexible transportation line having a stiffness that varies along the flexibletransportation line such that said flexible transportation line can be represented by a dynamictransfer function, said dynamic transfer function being adapted to a closed-loop transferfunction of the positioning system wherein the first object is a movable part of a long stroke module and the secondobject is a movable part of a short stroke module.
    10. The lithographic apparatus of clause 9, wherein a first part of the flexibletransportation line that is attached to the movable part of the long stroke module is orientatedsubstantially parallel to a first direction of movement of the movable part.
    11. The lithographic apparatus of clause 10, wherein the first direction of movement is ascan direction.
    权利要求:
    Claims (1)
    [1]
    A lithography apparatus comprising: an illumination device adapted to provide a radiation beam, a support constructed to support a patterning device, which patterning device is capable of applying a pattern in a cross-section of radiation beam to form a patterned radiation beam, a substrate table constructed; to support a substrate; and a projection device adapted to project the patterned radiation beam onto a target area of the substrate, characterized in that the substrate table is adapted to position the target area of the substrate in a focal plane of the projection device.
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    同族专利:
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    CN101840161B|2014-05-07|
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    TW201106119A|2011-02-16|
    TWI421651B|2014-01-01|
    CN101840161A|2010-09-22|
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    法律状态:
    2011-01-19| WDAP| Patent application withdrawn|Effective date: 20110117 |
    优先权:
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    US16159409P| true| 2009-03-19|2009-03-19|
    US16159409|2009-03-19|
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